Immersion Lithography : Promises, Challenges, and Solutions

Résumé du document

This paper will introduce lithography, and the issues that are contributing to the development of immersion lithography. We will explain the advantages of immersion lithography and its problems, and try to consider its future. Immersion Lithography is an optical lithography technique that promises to enhance the resolution capabilities of current systems. This technology is attractive to the semiconductor industry because it will delay or make obsolete a costly switchover to the extreme ultraviolet process (EUV).

Extraits

[...] Smith, Y. Fan, M. Slocum, and L. Zavyalova, "25nm Immersion Lithography at a 193nm Wavelength," RIT B. W. Smith, H. Kang, A. Bourov, F. Cropanese, and Y. Fan, "Water Immersion Optical Lithography for the 45nm Node," RIT Y. Fan, N. Lafferty, A. Bourov, L. Zavyalova, and B. W. Smith, "Study of Air Bubble Induced Light Scattering Effect On Image Quality in 193nm Immersion Lithography," RIT J. Zhou, Y. Fan, A. Bourov, and B. [...]

[...] If the index of refraction of the last optics element can be increased, immersion lithography will be able to enter a third generation of development [20]. Figure Summary of factors affective the NAs of an Immersion Lithography system Defects in Immersion Lithography Bubble Defect One of the concerns in the emerging technology of immersion lithography is the possibility of bubble formation defects in the immersion fluid. The greatest impact is due to bubbles present in the liquid which are very close to the resist surface. [...]

[...] Matsuura, T. Ishimaru, Y. Matsubara, and W. Wakamiya, "Status of 157 nm lithography and prospects for immersion," Proc. SPIE, vol V. Liberman, S. T. Palmacci, D. E. Hardy, M. Rothschild, and A. Grenville, "Controlled Contamination Studies in 193-nm Immersion Lithography," Proc. SPIE, vol I. Pollentier, M. Ercken, P. Foubert, and S. Y. Cheng, "Resist profile control in immersion lithography using scatterometry measurements," Proc. SPIE, vol M. [...]

[...] "193 nm immersion lithography," IMEC Other Resources Used H. Sewell, D. McCafferty, L. Markoya, and M. Riggs, "Immersion Lithography Next Step on the Roadmap," presented at Brewer Science ARC Symposium, Albany, NY C. Sparkes, "NSR-S609B Immersion Scanner," presented at Technology Innovation Showcase Karlsruhe, Germany "Degassing Pump, Degassing Equipment” . M. Switkes, V. Liberman, and M. Rothschild, "Water for Immersion Lithography," presented at Lincoln Laboratory, Massachusetts institute of Technology, Lexington, MA Lincoln labs J. D. Plummer, M. D. Deal, and P. [...]

[...] Immersion Lithography: Promises, Challenges, and Solutions Abstract This paper will introduce lithography and issues that are contributing to the development of immersion lithography. We will explain the advantages of immersion lithography, its problems, and try to consider its future. Immersion Lithography is an optical lithography technique that promises to enhance the resolution capabilities of current systems. This technology is attractive to the semiconductor industry because it will delay or make obsolete a costly switchover to the extreme ultraviolet process (EUV). [...]